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Results: 1-16 |
Results: 16
STM lithography in an organic self-assembled monolayer
Authors: Kleineberg, U Brechling, A Sundermann, M Heinzmann, U
Citation: U. Kleineberg et al., STM lithography in an organic self-assembled monolayer, ADV FUNCT M, 11(3), 2001, pp. 208-212
Silicon oxide nanolayers for soft X-ray optics produced by plasma enhancedCVD
Authors: Hamelmann, F Aschentrup, A Schmalhorst, J Kleineberg, U Heinzmann, U Dittmar, K Jutzi, P
Citation: F. Hamelmann et al., Silicon oxide nanolayers for soft X-ray optics produced by plasma enhancedCVD, J PHYS IV, 11(PR3), 2001, pp. 431-436
Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy
Authors: Kleineberg, U Haindl, G Hutten, A Reiss, G Gullikson, EM Jones, MS Mrowka, S Rekawa, SB Underwood, JH
Citation: U. Kleineberg et al., Microcharacterization of the surface oxidation of Py/Cu multilayers by scanning X-ray absorption spectromicroscopy, APPL PHYS A, 73(4), 2001, pp. 515-519
Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth
Authors: Lim, YC Westermalbesloh, T Aschentrup, A Wehmeyer, O Haindl, G Kleineberg, U Heinzmann, U
Citation: Yc. Lim et al., Fabrication and characterization of EUV multilayer mirrors optimized for small spectral reflection bandwidth, APPL PHYS A, 72(1), 2001, pp. 121-124
Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers - X-ray comparative study
Authors: Anopchenko, A Jergel, M Majkova, E Luby, S Holy, V Aschentrup, A Kolina, I Lim, YC Haindl, G Kleineberg, U Heinzmann, U
Citation: A. Anopchenko et al., Effect of substrate heating and ion beam polishing on the interface quality in Mo/Si multilayers - X-ray comparative study, PHYSICA B, 305(1), 2001, pp. 14-20
Giant magnetoresistance of hysteresis-free Cu/Co-based multilayers
Authors: Hutten, A Hempel, T Schepper, W Kleineberg, U Reiss, G
Citation: A. Hutten et al., Giant magnetoresistance of hysteresis-free Cu/Co-based multilayers, J MAGN MAGN, 226, 2001, pp. 1758-1760
Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films
Authors: Klipp, A Hamelmann, F Haindl, G Hartwich, J Kleineberg, U Jutzi, P Heinzmann, U
Citation: A. Klipp et al., Pentamethylcyclopentadienyl disilane as a novel precursor for the CVD of thin silicon films, CHEM VAPOR, 6(2), 2000, pp. 63
Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy
Authors: Dreeskornfeld, L Segler, R Haindl, G Wehmeyer, O Rahn, S Majkova, E Kleineberg, U Heinzmann, U Hudek, P Kostic, I
Citation: L. Dreeskornfeld et al., Reactive ion etching with end point detection of microstructured Mo/Si multilayers by optical emission spectroscopy, MICROEL ENG, 54(3-4), 2000, pp. 303-314
Metal oxide/silicon oxide multilayer with smooth interfaces produced by insitu controlled plasma-enhanced MOCVD
Authors: Hamelmann, F Haindl, G Schmalhorst, J Aschentrup, A Majkova, E Kleineberg, U Heinzmann, U Klipp, A Jutzi, P Anopchenko, A Jergel, M Luby, S
Citation: F. Hamelmann et al., Metal oxide/silicon oxide multilayer with smooth interfaces produced by insitu controlled plasma-enhanced MOCVD, THIN SOL FI, 358(1-2), 2000, pp. 90-93
Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STMlithography in self-assembled monolayers
Authors: Sundermann, M Hartwich, J Rott, K Meyners, D Majkova, E Kleineberg, U Grunze, M Heinzmann, U
Citation: M. Sundermann et al., Nanopatterning of Au absorber films on Mo/Si EUV multilayer mirrors by STMlithography in self-assembled monolayers, SURF SCI, 454, 2000, pp. 1104-1109
Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY
Authors: Kleineberg, U Menke, D Hamelmann, F Heinzmann, U Schmidt, O Fecher, GH Schoenhense, G
Citation: U. Kleineberg et al., Photoemission microscopy with microspot-XPS by use of undulator radiation and a high-throughput multilayer monochromator at BESSY, J ELEC SPEC, 103, 1999, pp. 931-936
Application of reactive ion etching to the fabrication of microstructure on Mo/Si multilayer
Authors: Le, ZC Dreeskornfeld, L Rahn, S Segler, R Kleineberg, U Heinzmann, U
Citation: Zc. Le et al., Application of reactive ion etching to the fabrication of microstructure on Mo/Si multilayer, CHIN PHYS L, 16(9), 1999, pp. 665-666
Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing
Authors: Luby, S Jergel, M Anopchenko, A Aschentrup, A Hamelmann, F Majkova, E Kleineberg, U Heinzmann, U
Citation: S. Luby et al., Thermal behaviour of Co/Si/W/Si multilayers under rapid thermal annealing, APPL SURF S, 150(1-4), 1999, pp. 178-184
STM writing of artificial nanostructures in alkanethiol-type self-assembled monolayers
Authors: Hartwich, J Sundermann, M Kleineberg, U Heinzmann, U
Citation: J. Hartwich et al., STM writing of artificial nanostructures in alkanethiol-type self-assembled monolayers, APPL SURF S, 145, 1999, pp. 538-542
W/Si multilayers deposited by hot-filament MOCVD
Authors: Hamelmann, F Petri, SHA Klipp, A Haindl, G Hartwich, J Dreeskornfeld, L Kleineberg, U Jutzi, P Heinzmann, U
Citation: F. Hamelmann et al., W/Si multilayers deposited by hot-filament MOCVD, THIN SOL FI, 338(1-2), 1999, pp. 70-74
Comparison of mechanically ruled versus holographically varied line-spacing gratings for a soft-x-ray flat-field spectrograph
Authors: Yamazaki, T Gullikson, E Miyata, N Koike, M Harada, Y Mrowka, S Kleineberg, U Underwood, JH Yanagihara, MM Sano, K
Citation: T. Yamazaki et al., Comparison of mechanically ruled versus holographically varied line-spacing gratings for a soft-x-ray flat-field spectrograph, APPL OPTICS, 38(19), 1999, pp. 4001-4003
Risultati: 1-16 |