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Results: 1-9 |
Results: 9
Resolution enhanced proximity printing by phase and amplitude modulating masks
Authors: Buhling, S Wyrowski, F Kley, EB Nellissen, AJM Wang, LL Dirkzwager, M
Citation: S. Buhling et al., Resolution enhanced proximity printing by phase and amplitude modulating masks, J MICROM M, 11(5), 2001, pp. 603-611
A surface-emitting circular grating polymer laser
Authors: Bauer, C Giessen, H Schnabel, B Kley, EB Schmitt, C Scherf, U Mahrt, RF
Citation: C. Bauer et al., A surface-emitting circular grating polymer laser, ADVAN MATER, 13(15), 2001, pp. 1161
120-nm lithography using off-axis TIR holography and 364 nm exposure wavelength
Authors: Barge, M Bruynooghe, S Clube, F Nobari, A Saussol, JL Grass, E Mayer, H Schnabel, B Kley, EB
Citation: M. Barge et al., 120-nm lithography using off-axis TIR holography and 364 nm exposure wavelength, MICROEL ENG, 57-8, 2001, pp. 59-63
Intermittence effect in electron beam writing
Authors: Wittig, LC Cumme, A Harzendorf, T Kley, EB
Citation: Lc. Wittig et al., Intermittence effect in electron beam writing, MICROEL ENG, 57-8, 2001, pp. 321-326
On the influence of the e-beam writer address grid on the optical quality of high-frequency gratings
Authors: Schnabel, B Kley, EB
Citation: B. Schnabel et Eb. Kley, On the influence of the e-beam writer address grid on the optical quality of high-frequency gratings, MICROEL ENG, 57-8, 2001, pp. 327-333
Micro-optical elements and their integration to glass and optoelectronic wafers
Authors: Dannberg, P Erdmann, L Bierbaum, R Krehl, A Brauer, A Kley, EB
Citation: P. Dannberg et al., Micro-optical elements and their integration to glass and optoelectronic wafers, MICROSYST T, 6(2), 1999, pp. 41-47
Study on polarizing visible light by subwavelength-period metal-stripe gratings
Authors: Schnabel, B Kley, EB Wyrowski, F
Citation: B. Schnabel et al., Study on polarizing visible light by subwavelength-period metal-stripe gratings, OPT ENG, 38(2), 1999, pp. 220-226
Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass
Authors: Gimkiewicz, C Hagedorn, D Jahns, J Kley, EB Thoma, F
Citation: C. Gimkiewicz et al., Fabrication of microprisms for planar optical interconnections by use of analog gray-scale lithography with high-energy-beam-sensitive glass, APPL OPTICS, 38(14), 1999, pp. 2986-2990
Polarization multiplexing of diffractive elements with metal-stripe grating pixels
Authors: Zeitner, UD Schnabel, B Kley, EB Wyrowski, F
Citation: Ud. Zeitner et al., Polarization multiplexing of diffractive elements with metal-stripe grating pixels, APPL OPTICS, 38(11), 1999, pp. 2177-2181
Risultati: 1-9 |