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Results: 1-3 |
Results: 3
An optimum feedback coil position for active stabilization of resistive wall modes
Authors: Jhang, HG Ku, SH Kim, JY
Citation: Hg. Jhang et al., An optimum feedback coil position for active stabilization of resistive wall modes, PHYS PLASMA, 8(6), 2001, pp. 3107-3110
Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source
Authors: Kim, SS Hamaguchi, S Yoon, NS Chang, CS Lee, YD Ku, SH
Citation: Ss. Kim et al., Numerical investigation on plasma and poly-Si etching uniformity control over a large area in a resonant inductively coupled plasma source, PHYS PLASMA, 8(4), 2001, pp. 1384-1394
Strong variation of average ion energy in oscillation frequency of sheath potential
Authors: Lee, YD Kim, SS Ku, SH Chang, CS
Citation: Yd. Lee et al., Strong variation of average ion energy in oscillation frequency of sheath potential, PHYS PLASMA, 7(2), 2000, pp. 766-769
Risultati: 1-3 |