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Results:
1-9
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Results: 9
Authors:
Bates, AK
Rothschild, M
Bloomstein, TM
Fedynyshyn, TH
Kunz, RR
Liberman, V
Switkes, M
Citation: Ak. Bates et al., Review of technology for 157-nm lithography, IBM J RES, 45(5), 2001, pp. 605-614
Authors:
Fedynyshyn, TH
Kunz, RR
Sinta, RF
Goodman, RB
Doran, SP
Citation: Th. Fedynyshyn et al., Polymer photochemistry at advanced optical wavelengths, J VAC SCI B, 18(6), 2000, pp. 3332-3339
Authors:
Kunz, RR
Liberman, V
Downs, DK
Citation: Rr. Kunz et al., Experimentation and modeling of organic photocontamination on lithographicoptics, J VAC SCI B, 18(3), 2000, pp. 1306-1313
Authors:
Cohen, AE
Kunz, RR
Citation: Ae. Cohen et Rr. Kunz, Large-area interdigitated array microelectrodes for electrochemical sensing, SENS ACTU-B, 62(1), 2000, pp. 23-29
Authors:
Rothschild, M
Bloomstein, TM
Curtin, JE
Downs, DK
Fedynyshyn, TH
Hardy, DE
Kunz, RR
Liberman, V
Sedlacek, JHC
Uttaro, RS
Bates, AK
Van Peski, C
Citation: M. Rothschild et al., 157 nm: Deepest deep-ultraviolet yet, J VAC SCI B, 17(6), 1999, pp. 3262-3266
Authors:
Kunz, RR
Bloomstein, TM
Hardy, DE
Goodman, RB
Downs, DK
Curtin, JE
Citation: Rr. Kunz et al., Outlook for 157 nm resist design, J VAC SCI B, 17(6), 1999, pp. 3267-3272
Authors:
Kunz, RR
Downs, DK
Citation: Rr. Kunz et Dk. Downs, Outgassing of organic vapors from 193 nm photoresists: Impact on atmospheric purity near the lens optics, J VAC SCI B, 17(6), 1999, pp. 3330-3334
Authors:
Ingall, MDK
Honeyman, CH
Mercure, JV
Bianconi, PA
Kunz, RR
Citation: Mdk. Ingall et al., Surface functionalization and imaging using monolayers and surface-graftedpolymer layers, J AM CHEM S, 121(15), 1999, pp. 3607-3613
Authors:
Bloomstein, TM
Rothschild, M
Kunz, RR
Hardy, DE
Goodman, RB
Palmacci, ST
Citation: Tm. Bloomstein et al., Critical issues in 157 nm lithography, J VAC SCI B, 16(6), 1998, pp. 3154-3157
Risultati:
1-9
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