Authors: CHU PK QIN S CHAN C CHEUNG NW LARSON LA

Citation: Pk. Chu et al., PLASMA IMMERSION ION-IMPLANTATION - A FLEDGLING TECHNIQUE FOR SEMICONDUCTOR PROCESSING, Materials science & engineering. R, Reports, 17(6-7), 1996, pp. 207-280

Authors: CURRENT MI MATHUR R KUMP M LARSON LA

Citation: Mi. Current et al., PROCESS SIMULATION CHALLENGES FOR ULSI DEVICES - A USERS PERSPECTIVE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 102(1-4), 1995, pp. 198-201

Authors: LARSON LA KEENAN WA JOHNSON WH

Citation: La. Larson et al., A SHEET RESISTANCE STANDARD FOR ION IMPLANT, Solid state technology, 36(10), 1993, pp. 67

Authors: LARSON LA

Citation: La. Larson, THE MISSISSIPPI FLOOD, Environment, 35(10), 1993, pp. 4-5

Authors: YARLING CB JOHNSON WH KEENAN WA LARSON LA

Citation: Cb. Yarling et al., UNIFORMITY MAPPING IN ION-IMPLANTATION .2., Solid state technology, 35(3), 1992, pp. 29-32