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Results: 5
PLASMA IMMERSION ION-IMPLANTATION - A FLEDGLING TECHNIQUE FOR SEMICONDUCTOR PROCESSING
Authors:
CHU PK QIN S CHAN C CHEUNG NW LARSON LA
Citation:
Pk. Chu et al., PLASMA IMMERSION ION-IMPLANTATION - A FLEDGLING TECHNIQUE FOR SEMICONDUCTOR PROCESSING, Materials science & engineering. R, Reports, 17(6-7), 1996, pp. 207-280
PROCESS SIMULATION CHALLENGES FOR ULSI DEVICES - A USERS PERSPECTIVE
Authors:
CURRENT MI MATHUR R KUMP M LARSON LA
Citation:
Mi. Current et al., PROCESS SIMULATION CHALLENGES FOR ULSI DEVICES - A USERS PERSPECTIVE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 102(1-4), 1995, pp. 198-201
A SHEET RESISTANCE STANDARD FOR ION IMPLANT
Authors:
LARSON LA KEENAN WA JOHNSON WH
Citation:
La. Larson et al., A SHEET RESISTANCE STANDARD FOR ION IMPLANT, Solid state technology, 36(10), 1993, pp. 67
THE MISSISSIPPI FLOOD
Authors:
LARSON LA
Citation:
La. Larson, THE MISSISSIPPI FLOOD, Environment, 35(10), 1993, pp. 4-5
UNIFORMITY MAPPING IN ION-IMPLANTATION .2.
Authors:
YARLING CB JOHNSON WH KEENAN WA LARSON LA
Citation:
Cb. Yarling et al., UNIFORMITY MAPPING IN ION-IMPLANTATION .2., Solid state technology, 35(3), 1992, pp. 29-32
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