Citation: Gw. Rubloff et M. Liehr, PAPERS FROM THE TOPICAL CONFERENCE ON MANUFACTURING SCIENCE AND TECHNOLOGY - 24-27 OCTOBER 1994, COLORADO CONVENTION CENTER, DENVER, COLORADO - PREFACE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1861-1861
Citation: M. Liehr et Gw. Rubloff, CONCEPTS IN COMPETITIVE MICROELECTRONICS MANUFACTURING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(4), 1994, pp. 2727-2740
Citation: Gw. Rubloff et al., INTEGRATED PROCESSING OF MOS GATE DIELECTRIC STRUCTURES, IEEE transactions on semiconductor manufacturing, 7(1), 1994, pp. 96-100
Authors:
LIEHR M
SCHLAPP M
TRASSL R
HOFMANN G
STENKE M
VOLPEL R
SALZBORN E
Citation: M. Liehr et al., INVESTIGATIONS OF THE NEW GIESSEN 10-GHZ ELECTRON-CYCLOTRON-RESONANCEION-SOURCE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 79(1-4), 1993, pp. 697-700
Authors:
MCCULLOUGH RW
GEDDES J
DONNELLY A
LIEHR M
GILBODY HB
Citation: Rw. Mccullough et al., A NEW REACTIVE ATOM BEAM SOURCE FOR ACCELERATOR TARGET STUDIES, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 79(1-4), 1993, pp. 708-710