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Results:
1-8
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Results: 8
Authors:
Lamontagne, B
Abou Elela, S
Citation: B. Lamontagne et S. Abou Elela, Purification and characterization of Saccharomyces cerevisiae Rnt1p nuclease, METH ENZYM, 342, 2001, pp. 159-167
Authors:
Williams, RL
Aers, GC
Poole, PJ
Lefebvre, J
Chithrani, D
Lamontagne, B
Citation: Rl. Williams et al., Controlling the self-assembly of InAs/InP quantum dots, J CRYST GR, 223(3), 2001, pp. 321-331
Authors:
Bardwell, JA
Foulds, I
Lamontagne, B
Tang, H
Webb, JB
Marshall, P
Rolfe, SJ
Stapledon, J
MacElwee, TW
Citation: Ja. Bardwell et al., Fabrication of high performance GaN modulation doped field effect transistors, J VAC SCI A, 18(2), 2000, pp. 750-753
Authors:
Lamontagne, B
Tremblay, A
Abou Elela, S
Citation: B. Lamontagne et al., The N-terminal domain that distinguishes yeast from bacterial RNase III contains a dimerization signal required for efficient double-stranded RNA cleavage, MOL CELL B, 20(4), 2000, pp. 1104-1115
Authors:
He, JJ
Koteles, ES
Lamontagne, B
Erickson, L
Delage, A
Davies, M
Citation: Jj. He et al., Integrated polarization compensator for WDM waveguide demultiplexers, IEEE PHOTON, 11(2), 1999, pp. 224-226
Authors:
Poole, PJ
Williams, RL
Lacelle, C
Gupta, V
Fraser, JW
Lamontagne, B
Buchanan, M
Citation: Pj. Poole et al., Patterned substrate overgrowth for optoelectronic device integration usingchemical beam epitaxy (CBE), J CRYST GR, 202, 1999, pp. 578-581
Authors:
He, JJ
Lamontagne, B
Koteles, ES
Citation: Jj. He et al., Polarisation dispersion compensated AWG demultiplexer fabricated in singleshallow etching step, ELECTR LETT, 35(9), 1999, pp. 737-738
Authors:
Lamontagne, B
Stapledon, J
Chow-Chong, P
Buchanan, M
Fraser, J
Phillips, J
Davies, M
Citation: B. Lamontagne et al., InP etching using chemically assisted ion beam etching (Cl-2/Ar) - Formation of InClx clusters under high concentration of chlorine, J ELCHEM SO, 146(5), 1999, pp. 1918-1920
Risultati:
1-8
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