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Results:
1-3
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Results: 3
Authors:
Cleavelin, CR
Covington, BC
Larson, LA
Citation: Cr. Cleavelin et al., Front end of line considerations far progression beyond the 100 nm node ultrashallow junction requirements, J VAC SCI B, 18(1), 2000, pp. 346-353
Authors:
Chu, PK
Felch, SB
Kellerman, P
Sinclair, F
Larson, LA
Mizuno, B
Citation: Pk. Chu et al., Plasma doping: Progress and potential, SOL ST TECH, 42(9), 1999, pp. 55
Authors:
Chu, PK
Felch, SB
Kellerman, P
Sinclair, F
Larson, LA
Mizuno, B
Citation: Pk. Chu et al., Plasma doping: Progress and potential - Part two of two, SOL ST TECH, 42(10), 1999, pp. 77
Risultati:
1-3
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