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Authors: Chang, CH Leou, KC Lin, C

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Citation: Hk. Chiu et al., Characterization of titanium nitride etch rate and selectivity to silicon dioxide in a Cl-2 helicon-wave plasma, J VAC SCI A, 19(2), 2001, pp. 455-459

Authors: Leou, KC Tsai, SC Chang, CH Chiang, WY Lin, TL Tsai, CH

Citation: Kc. Leou et al., Experimental characterization of an inductively coupled plasma discharge using a shape-adjustable coil, JPN J A P 1, 38(7B), 1999, pp. 4268-4274