Authors:
Lubomirsky, I
Wang, TY
Gartsman, K
Stafsudd, OM
Citation: I. Lubomirsky et al., Principle of low-energy electron beam-induced current imaging for ferroelectric thin films, ADVAN MATER, 12(2), 2000, pp. 91-94
Citation: I. Lubomirsky et D. Cahen, Do dopant diffusion and drift decide semiconductor device degradation and dimension Limits?, SOL ST ION, 136, 2000, pp. 559-565
Citation: I. Lubomirsky et D. Cohen, Chemical limit to semiconductor device miniaturization (vol 2, pg 154, 1999), EL SOLID ST, 2(4), 1999, pp. NIL_2-NIL_2
Authors:
Lubomirsky, I
Wang, TY
Deflaviis, F
Stafsudd, OM
Citation: I. Lubomirsky et al., Low loss tunable (Ba,Sr)TiO3 ceramics utilizing intragrain concentration gradient, INTEGR FERR, 24(1-4), 1999, pp. 319-326