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Authors: LEUSCHNER R AHNE H MARQUARDT U NICKEL U SCHMIDT E SEBALD M SEZI R
Citation: R. Leuschner et al., PATTERNING OF ORGANIC LAYERS USING NEGATIVE AND POSITIVE WORKING TOP-CARL PROCESS, Microelectronic engineering, 21(1-4), 1993, pp. 255-258

Authors: LEUSCHNER R AHNE H MARQUARDT U NICKEL U SCHMIDT E SEBALD M SEZI R
Citation: R. Leuschner et al., PATTERNING OF ORGANIC LAYERS USING NEGATIVE AND POSITIVE WORKING TOP-CARL PROCESS, Microelectronic engineering, 20(4), 1993, pp. 305-319
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