Authors:
STERN MB
PALMATEER SC
HORN MW
ROTHSCHILD M
MAXWELL BE
CURTIN JE
Citation: Mb. Stern et al., PROFILE CONTROL IN DRY DEVELOPMENT OF HIGH-ASPECT-RATIO RESIST STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3017-3021