Citation: Ck. Hu et al., ELECTROMIGRATION IN 2-LEVEL BAMBOO GRAIN-STRUCTURE AL(CU) W INTERCONNECTIONS/, Materials chemistry and physics, 35(1), 1993, pp. 95-98
Authors:
KOBEDA E
MAZZEO NJ
GAMBINO JP
NG H
PATTON GL
WARNOCK JD
BASAVAIAH S
WHITE JF
CRESSLER JD
Citation: E. Kobeda et al., FABRICATION OF TUNGSTEN LOCAL INTERCONNECT FOR VLSI BIPOLAR TECHNOLOGY, Journal of the Electrochemical Society, 140(10), 1993, pp. 3007-3013