Authors: BELL DA MCCONICA CM BAKER KL KUCHTA E

Citation: Da. Bell et al., BATCH REACTOR KINETIC-STUDIES OF TUNGSTEN LPCVD FROM SILANE AND TUNGSTEN HEXAFLUORIDE, Journal of the Electrochemical Society, 143(1), 1996, pp. 296-302

Authors: MCCONICA CM BELL DA BAKER KL MOSS D

Citation: Cm. Mcconica et al., LABORATORY BATCH REACTOR METHOD FOR KINETIC-STUDY OF CHEMICAL-VAPOR-DEPOSITION, AIChE journal, 42(4), 1996, pp. 1108-1115

Authors: BELL DA FALCONER JL MCCONICA CM

Citation: Da. Bell et al., DESORPTION OF TUNGSTEN FLUORIDES FROM TUNGSTEN, Journal of the Electrochemical Society, 142(7), 1995, pp. 2401-2404

Authors: BELL DA FALCONER JL LU ZM MCCONICA CM

Citation: Da. Bell et al., ELECTRON-BEAM-INDUCED DEPOSITION OF TUNGSTEN, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(5), 1994, pp. 2976-2979

Authors: BELL DA MCCONICA CM FALCONER JL LU ZM

Citation: Da. Bell et al., CORROSION OF REACTOR WALL SURFACES BY WF(6), Journal of the Electrochemical Society, 141(10), 1994, pp. 2884-2888

Authors: IYER R LILE DL MCCONICA CM

Citation: R. Iyer et al., MASS-SPECTROMETRIC STUDIES OF SIO2 DEPOSITION IN AN INDIRECT PLASMA-ENHANCED LPCVD SYSTEM, Journal of the Electrochemical Society, 140(5), 1993, pp. 1430-1434