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Authors: MURAY LP ANDERSON EH BOEGLI V
Citation: Lp. Muray et al., DESIGN AND IMPLEMENTATION OF A REAL-TIME HIERARCHICAL PARALLEL POSTPROCESSOR FOR 100 KEV ELECTRON-BEAM LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2204-2208

Authors: ANDERSON EH BOEGLI V MURAY LP
Citation: Eh. Anderson et al., ELECTRON-BEAM LITHOGRAPHY DIGITAL PATTERN GENERATOR AND ELECTRONICS FOR GENERALIZED CURVILINEAR STRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2529-2534

Authors: KIM HS YU ML STAUFER U MURAY LP KERN DP CHANG THP
Citation: Hs. Kim et al., OXYGEN PROCESSED FIELD-EMISSION TIPS FOR MICROCOLUMN APPLICATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2327-2331
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