Authors: Majamaa, T Kilpela, O

Citation: T. Majamaa et O. Kilpela, Effect of oxidation temperature on the electrical characteristics of ultrathin silicon dioxide layers plasma oxidized in ultrahigh vacuum, PHYS SCR, T79, 1999, pp. 259-262

Authors: Majamaa, T Kilpela, O Novikov, S Sinkkonen, J

Citation: T. Majamaa et al., Annealing of ultrathin silicon dioxide layers plasma oxidized in ultrahighvacuum, APPL SURF S, 142(1-4), 1999, pp. 351-355