Authors: Ravindra, NM Downey, DF Marcus, SD Sopori, BL

Citation: Nm. Ravindra et al., Special issue on manufacturing issues in rapid thermal processing - Foreword, J ELEC MAT, 28(12), 1999, pp. 1327-1327

Authors: Downey, DF Falk, SW Bertuch, AF Marcus, SD

Citation: Df. Downey et al., Effects of "fast" rapid thermal anneals on sub-keV boron and BF2 ion implants, J ELEC MAT, 28(12), 1999, pp. 1340-1344

Authors: Lerch, W Gluck, M Stolwijk, NA Walk, H Schafer, M Marcus, SD Downey, DF Chow, JW

Citation: W. Lerch et al., Boron ultrashallow junction formation in silicon by low-energy implantation and rapid thermal annealing in inert and oxidizing ambient, J ELCHEM SO, 146(7), 1999, pp. 2670-2678

Authors: Downey, DF Marcus, SD Chow, JW

Citation: Df. Downey et al., Optimization of RTA parameters to produce ultra-shallow, highly activated B+, BF2+, and As+ ion implanted junctions, J ELEC MAT, 27(12), 1998, pp. 1296-1314