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Citation: A. Claverie et al., Nucleation, growth and dissolution of extended defects in implanted Si: impact on dopant diffusion, NUCL INST B, 147(1-4), 1999, pp. 1-12

Authors: Ortiz, C Grob, JJ Mathiot, D Claverie, A Dubois, C Jerisian, R

Citation: C. Ortiz et al., Thermal redistribution of Al implanted in Si: evidences for interactions with extended defects, NUCL INST B, 147(1-4), 1999, pp. 122-126