Authors:
Hunsche, B
Vergohl, M
Neuhauser, H
Klose, F
Szyszka, B
Matthee, T
Citation: B. Hunsche et al., Effect of deposition parameters on optical and mechanical properties of MF- and DC-sputtered Nb2O5 films, THIN SOL FI, 392(2), 2001, pp. 184-190
Authors:
Vergohl, M
Malkomes, N
Matthee, T
Brauer, G
Richter, U
Nickol, FW
Bruch, J
Citation: M. Vergohl et al., In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry, THIN SOL FI, 392(2), 2001, pp. 258-264
Authors:
Vergohl, M
Hunsche, B
Malkomes, N
Matthee, T
Szyszka, B
Citation: M. Vergohl et al., Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics, J VAC SCI A, 18(4), 2000, pp. 1709-1712
Authors:
Vergohl, M
Malkomes, N
Matthee, T
Brauer, G
Citation: M. Vergohl et al., Real time control of reactive magnetron-sputter deposited optical filters by in situ spectroscopic ellipsometry, THIN SOL FI, 377, 2000, pp. 43-47
Authors:
Vergohl, M
Malkomes, N
Staedler, T
Matthee, T
Richter, U
Citation: M. Vergohl et al., Ex situ and in situ spectroscopic ellipsometry of MF and DC-sputtered TiO2and SiO2 films for process control, THIN SOL FI, 351(1-2), 1999, pp. 42-47