Citation: Sj. Mcnab et Rj. Blaikie, Contrast in the evanescent near field of lambda/20 period gratings for photolithography, APPL OPTICS, 39(1), 2000, pp. 20-25
Authors:
Alkaisi, MM
Blaikie, RJ
McNab, SJ
Cheung, R
Cumming, DRS
Citation: Mm. Alkaisi et al., Sub-diffraction-limited patterning using evanescent near-field optical lithography, APPL PHYS L, 75(22), 1999, pp. 3560-3562