AAAAAA

   
Results: 1-3 |
Results: 3
Characterization of field stitching in electron-beam lithography using moire metrology
Authors: Murphy, TE Mondol, MK Smith, HI
Citation: Te. Murphy et al., Characterization of field stitching in electron-beam lithography using moire metrology, J VAC SCI B, 18(6), 2000, pp. 3287-3291
Novel mask-wafer gap measurement scheme with nanometer-level detectivity
Authors: Moon, EE Everett, PN Meinhold, MW Mondol, MK Smith, HI
Citation: Ee. Moon et al., Novel mask-wafer gap measurement scheme with nanometer-level detectivity, J VAC SCI B, 17(6), 1999, pp. 2698-2702
Maskless, parallel patterning with zone-plate array lithography
Authors: Carter, DJD Gil, D Menon, R Mondol, MK Smith, HI Anderson, EH
Citation: Djd. Carter et al., Maskless, parallel patterning with zone-plate array lithography, J VAC SCI B, 17(6), 1999, pp. 3449-3452
Risultati: 1-3 |