Authors: Tsuboi, S Watanabe, H Ezaki, M Aoyama, H Kikuchi, Y Nakayama, Y Ohki, S Watanabe, T Morosawa, T Saito, K Oda, M Matsuda, T

Citation: S. Tsuboi et al., Precise delineation characteristics of advanced electron beam mask writer EB-X3 for fabricating 1x X-ray masks, JPN J A P 1, 39(12B), 2000, pp. 6902-6907

Authors: Ezaki, M Nakayama, Y Kikuchi, Y Tsuboi, S Watanabe, H Aoyama, H Matsui, Y Morosawa, T Ohki, S Saito, K Matsuda, T

Citation: M. Ezaki et al., Critical-dimension controllability of chemically amplified resists for X-ray membrane mask fabrication, JPN J A P 1, 39(12B), 2000, pp. 6908-6913

Authors: Ohki, S Watanabe, T Takeda, Y Morosawa, T Saito, K Kunioka, T Kato, J Shimizu, A Matsuda, T Tsuboi, S Aoyama, H Watanabe, H Nakayama, Y

Citation: S. Ohki et al., Patterning performance of EB-X3 x-ray mask writer, J VAC SCI B, 18(6), 2000, pp. 3084-3088

Authors: Morosawa, T Saito, K Takeda, Y Kunioka, T Shimizu, A Kato, J Matsuda, T Kuriyama, Y Nakayama, Y Matsui, Y

Citation: T. Morosawa et al., EB-X3: New electron-beam x-ray mask writer, J VAC SCI B, 17(6), 1999, pp. 2907-2911

Authors: Shimazu, N Morosawa, T Saito, K Kunioka, T Takeda, Y Watanabe, T

Citation: N. Shimazu et al., Electron beam writing system for X-ray masks, NTT REVIEW, 10(6), 1998, pp. 65-69