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Citation: Te. Murphy et al., Characterization of field stitching in electron-beam lithography using moire metrology, J VAC SCI B, 18(6), 2000, pp. 3287-3291

Authors: Murphy, TE Zandvakili, S

Citation: Te. Murphy et S. Zandvakili, Data- and metrics-driven approach to human resource practices: Using customers, employees, and financial metrics, HUM RESOUR, 39(1), 2000, pp. 93-105

Authors: Farhoud, M Ferrera, J Lochtefeld, AJ Murphy, TE Schattenburg, ML Carter, J Ross, CA Smith, HI

Citation: M. Farhoud et al., Fabrication of 200 nm period nanomagnet arrays using interference lithography and a negative resist, J VAC SCI B, 17(6), 1999, pp. 3182-3185

Authors: Lim, MH Murphy, TE Ferrera, J Damask, JN Smith, HI

Citation: Mh. Lim et al., Fabrication techniques for grating-based optical devices, J VAC SCI B, 17(6), 1999, pp. 3208-3211