Authors:
Gramlich, S
Nebauer, E
Sebastian, J
Beister, G
Citation: S. Gramlich et al., Damage profile of He implantation in AlGaAs laser diode material detected by photoluminescence, ELECTR LETT, 37(7), 2001, pp. 463-464
Citation: E. Nebauer et al., Au/Pt/Ti/Pt base contacts to n-InGaP/p(+)-GaAs for self-passivating HBT ledge structures, SEMIC SCI T, 15(8), 2000, pp. 818-822
Authors:
Wurfl, J
Hilsenbeck, J
Nebauer, E
Trankle, G
Obloh, H
Osterle, W
Citation: J. Wurfl et al., Reliability of AIGaN/GaN HFETs comprising refractory ohmic and Schottky contacts, MICROEL REL, 40(8-10), 2000, pp. 1689-1693
Authors:
Fenske, F
Fuhs, W
Nebauer, E
Schopke, A
Selle, B
Sieber, I
Citation: F. Fenske et al., Transparent conductive ZnO : Al films by reactive co-sputtering from separate metallic Zn and Al targets, THIN SOL FI, 344, 1999, pp. 130-133
Authors:
Brehme, S
Fenske, F
Fuhs, W
Nebauer, E
Poschenrieder, M
Selle, B
Sieber, I
Citation: S. Brehme et al., Free-carrier plasma resonance effects and electron transport in reactivelysputtered degenerate ZnO : Al films, THIN SOL FI, 342(1-2), 1999, pp. 167-173
Authors:
Hilsenbeck, J
Rieger, W
Nebauer, E
John, W
Trankle, G
Wurfl, J
Ramakrishan, A
Obloh, H
Citation: J. Hilsenbeck et al., AlGaN/GaN HFETs with new ohmic and Schottky contacts for thermal stabilityup to 400 degrees C, PHYS ST S-A, 176(1), 1999, pp. 183-187