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Results: 1-3 |
Results: 3
Comparison of the dynamic stress breakdown between oxide and oxy-nitride thin films on silicon
Authors: Novkovski, N
Citation: N. Novkovski, Comparison of the dynamic stress breakdown between oxide and oxy-nitride thin films on silicon, PHYS ST S-A, 182(2), 2000, pp. R8-R9
On the impeded growth of oxide films on Si in N2O ambient
Authors: Novkovski, N
Citation: N. Novkovski, On the impeded growth of oxide films on Si in N2O ambient, APPL PHYS A, 68(5), 1999, pp. 573-575
Stress degradation of low field leakage in alumina gate MOS structures containing RF magnetron sputtered thin Ta2O5 films on silicon
Authors: Novkovski, N Pecovska-Gjorgjevich, M Atanassova, E Dimitrova, T
Citation: N. Novkovski et al., Stress degradation of low field leakage in alumina gate MOS structures containing RF magnetron sputtered thin Ta2O5 films on silicon, PHYS ST S-A, 172(2), 1999, pp. R9-R10
Risultati: 1-3 |