Authors:
Liddle, JA
Blakey, MI
Bolan, K
Farrow, RC
Gallatin, GM
Kasica, R
Katsap, V
Knurek, CS
Li, J
Mkrtchyan, M
Novembre, AE
Ocola, L
Orphanos, PA
Peabody, ML
Stanton, ST
Teffeau, K
Waskiewicz, WK
Munro, E
Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481
Authors:
Farrow, RC
Waskiewicz, WK
Kizilyalli, I
Ocola, L
Felker, J
Biddick, C
Gallatin, G
Mkrtchyan, M
Blakey, M
Kraus, J
Novembre, A
Orphanos, P
Peabody, M
Kasica, R
Kornblit, A
Klemens, F
Citation: Rc. Farrow et al., CMOS compatible alignment marks for the SCALPEL proof of lithography tool, MICROEL ENG, 46(1-4), 1999, pp. 263-266
Authors:
Farrow, RC
Novembre, AE
Peabody, M
Kasica, R
Blakey, M
Liddle, JA
Werder, K
DeMarco, R
Ocola, L
Rutberg, L
Saunders, T
Unruh, J
Qian, F
Smith, M
Citation: Rc. Farrow et al., Commercialization of SCALPEL masks, J VAC SCI B, 16(6), 1998, pp. 3582-3586