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Citation: K. Uetani et al., Oxidation mechanism of ultra thin TiN films prepared by an advanced ion-plating method, MATER TRANS, 42(3), 2001, pp. 403-406

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Citation: K. Uetani et al., Ion-plating deposition of MgO thin films, MATER TRANS, 42(3), 2001, pp. 411-413

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Citation: A. Mimura et al., Flat and large poly-Si grains by a continuous process of plasma-enhanced chemical vapor deposition of a-Si and its direct laser crystallization, JPN J A P 2, 39(8A), 2000, pp. L779-L781

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Citation: K. Uetani et al., Ultra thin TiN films prepared by an advanced ion-plating method, MATER T JIM, 41(9), 2000, pp. 1161-1163

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Citation: K. Nakajima et al., Stress reduction of chromium thin films deposited by cluster-type sputtering system for ultra-large-size (550 x 650 mm) substrates, VACUUM, 51(4), 1998, pp. 761-764