Authors:
Liddle, JA
Blakey, MI
Bolan, K
Farrow, RC
Gallatin, GM
Kasica, R
Katsap, V
Knurek, CS
Li, J
Mkrtchyan, M
Novembre, AE
Ocola, L
Orphanos, PA
Peabody, ML
Stanton, ST
Teffeau, K
Waskiewicz, WK
Munro, E
Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481
Authors:
Farrow, RC
Gallatin, GM
Waskiewicz, WK
Liddle, JA
Kizilyalli, I
Kornblit, A
Biddick, C
Blakey, M
Klemens, F
Felker, J
Kraus, J
Mkrtchyan, M
Orphanos, PA
Layadi, N
Merchant, S
Citation: Rc. Farrow et al., Marks for SCALPEL((R)) tool optics optimization, MICROEL ENG, 53(1-4), 2000, pp. 309-312
Authors:
Eichner, L
Blakey, MI
Farrow, RC
Liddle, JA
Orphanos, PA
Waskiewicz, WK
Citation: L. Eichner et al., Optimization of a SCALPEL (R) exposure tool using a diffractive image quality technique, MICROEL ENG, 46(1-4), 1999, pp. 239-242