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Citation: Ja. Liddle et al., Space-charge effects in projection electron-beam lithography: Results fromthe SCALPEL proof-of-lithography system, J VAC SCI B, 19(2), 2001, pp. 476-481

Authors: Ocola, LE Orphanos, PA Li, WY Waskiewicz, W Novembre, AE Sato, M

Citation: Le. Ocola et al., Roughness study of a positive tone high performance SCALPEL resist, J VAC SCI B, 18(6), 2000, pp. 3435-3440

Authors: Farrow, RC Gallatin, GM Waskiewicz, WK Liddle, JA Kizilyalli, I Kornblit, A Biddick, C Blakey, M Klemens, F Felker, J Kraus, J Mkrtchyan, M Orphanos, PA Layadi, N Merchant, S

Citation: Rc. Farrow et al., Marks for SCALPEL((R)) tool optics optimization, MICROEL ENG, 53(1-4), 2000, pp. 309-312

Authors: Ocola, LE Li, WY Kasica, RJ Blakey, MI Orphanos, PA Waskiewicz, WK Novembre, AE Sato, M

Citation: Le. Ocola et al., Monte Carlo study of High performance resists for SCALPEL nanolithography, MICROEL ENG, 53(1-4), 2000, pp. 433-436

Authors: Eichner, L Blakey, MI Farrow, RC Liddle, JA Orphanos, PA Waskiewicz, WK

Citation: L. Eichner et al., Optimization of a SCALPEL (R) exposure tool using a diffractive image quality technique, MICROEL ENG, 46(1-4), 1999, pp. 239-242