Authors: Liu, X Babcock, JR Lane, MA Belot, JA Ott, AW Metz, M Kannewurf, CR Chang, RPH Marks, TJ

Citation: X. Liu et al., Plasma-assisted MOCVD growth of superconducting NbN thin films using Nb dialkylamide and Nb alkylimide precursors, CHEM VAPOR, 7(1), 2001, pp. 25

Authors: Ott, AW Chang, RPH

Citation: Aw. Ott et Rph. Chang, Atomic layer-controlled growth of transparent conducting ZnO on plastic substrates, MATER CH PH, 58(2), 1999, pp. 132-138

Authors: Klaus, JW Sneh, O Ott, AW George, SM

Citation: Jw. Klaus et al., Atomic layer deposition of SiO2 using catalyzed and uncatalyzed self-limiting surface reactions, SURF REV L, 6(3-4), 1999, pp. 435-448

Authors: Berland, BS Gartland, IP Ott, AW George, SM

Citation: Bs. Berland et al., In situ monitoring of atomic layer controlled pore reduction in alumina tubular membranes using sequential surface reactions, CHEM MATER, 10(12), 1998, pp. 3941-3950

Authors: Okada, LA Dillon, AC Ott, AW George, SM

Citation: La. Okada et al., Adsorption and decomposition of 1,4-disilabutane (SiH3CH2CH2SiH3) on Si(100)2x1 and porous silicon surfaces, SURF SCI, 418(2), 1998, pp. 353-366

Authors: Klaus, JW Ott, AW Dillon, AC George, SM

Citation: Jw. Klaus et al., Atomic layer controlled growth of Si3N4 films using sequential surface reactions, SURF SCI, 418(1), 1998, pp. L14-L19