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Results: 2
COMPARISON OF DRY DEVELOPMENT TECHNIQUES USING O-2 AND SO2 O-2 LOW-PRESSURE PLASMAS/
Authors:
PONS M JOUBERT O MARTINET C PELLETIER J PANABIERE JP WEILL A
Citation:
M. Pons et al., COMPARISON OF DRY DEVELOPMENT TECHNIQUES USING O-2 AND SO2 O-2 LOW-PRESSURE PLASMAS/, JPN J A P 1, 33(2), 1994, pp. 991-996
AN INDUSTRIAL PLASMA PROCESS FOR AVOIDING CHARGE EFFECT
Authors:
ROMAND P WEILL A PANABIERE JP PROLA A
Citation:
P. Romand et al., AN INDUSTRIAL PLASMA PROCESS FOR AVOIDING CHARGE EFFECT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3550-3554
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