Authors:
RAKHSHANDEHROO MR
WEIGOLD JW
TIAN WC
PANG SW
Citation: Mr. Rakhshandehroo et al., DRY-ETCHING OF SI FIELD EMITTERS AND HIGH-ASPECT-RATIO RESONATORS USING AN INDUCTIVELY-COUPLED PLASMA SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2849-2854
Authors:
PANG SW
TAMAMURA T
NAKAO M
OZAWA A
MASUDA H
Citation: Sw. Pang et al., DIRECT NANO-PRINTING ON AL SUBSTRATE USING A SIC MOLD, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1145-1149
Citation: Mr. Rakhshandehroo et Sw. Pang, FABRICATION OF SELF-ALIGNED SILICON FIELD-EMISSION DEVICES AND EFFECTS OF SURFACE PASSIVATION ON EMISSION CURRENT, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(2), 1998, pp. 765-769
Citation: Jw. Weigold et Sw. Pang, FABRICATION OF THICK SI RESONATORS WITH A FRONTSIDE-RELEASE ETCH-DIFFUSION PROCESS, Journal of microelectromechanical systems, 7(2), 1998, pp. 201-206
Citation: Wh. Juan et Sw. Pang, HIGH-ASPECT-RATIO SI VERTICAL MICROMIRROR ARRAYS FOR OPTICAL SWITCHING, Journal of microelectromechanical systems, 7(2), 1998, pp. 207-213
Authors:
LEUNG R
LAM CWK
CHAN A
LEE M
CHAN IHS
PANG SW
LAI CKW
Citation: R. Leung et al., INDOOR ENVIRONMENT OF RESIDENTIAL HOMES IN HONG-KONG - RELEVANCE TO ASTHMA AND ALLERGIC DISEASE, Clinical and experimental allergy, 28(5), 1998, pp. 585-590
Citation: T. Wang et al., METEOROLOGICAL AND CHEMICAL CHARACTERISTICS OF THE PHOTOCHEMICAL OZONE EPISODES OBSERVED AT CAPE DAGUILAR IN HONG-KONG, Journal of applied meteorology, 37(10), 1998, pp. 1167-1178
Citation: Jw. Weigold et al., DRY-ETCHING OF DEEP SI TRENCHES FOR RELEASED RESONATORS IN A CL-2 PLASMA, Journal of the Electrochemical Society, 145(5), 1998, pp. 1767-1771
Authors:
GLEMBOCKI OJ
TUCHMAN JA
DAGATA JA
KO KK
PANG SW
STUTZ CE
Citation: Oj. Glembocki et al., ELECTRONIC-PROPERTIES OF GAAS-SURFACES ETCHED IN AN ELECTRON-CYCLOTRON-RESONANCE SOURCE AND CHEMICALLY PASSIVATED USING P2S5, Applied physics letters, 73(1), 1998, pp. 114-116
Citation: Ew. Berg et Sw. Pang, TIME-DEPENDENCE OF ETCH-INDUCED DAMAGE GENERATED BY AN ELECTRON-CYCLOTRON-RESONANCE SOURCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2643-2647
Citation: Wh. Juan et al., HIGH REFLECTIVITY MICROMIRRORS FABRICATED BY COATING HIGH-ASPECT-RATIO SI SIDEWALLS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2661-2665
Citation: Mr. Rakhshandehroo et Sw. Pang, FIELD-EMISSION FROM GATED SI EMITTER TIPS WITH PRECISE GATE TIP SPACING, GATE DIAMETER, TIP SHARPNESS, AND TIP PROTRUSION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 2777-2781
Citation: F. Ying et al., ETCHING OF HIGH-ASPECT-RATIO MICROGRAVITY STRUCTURES IN INP, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 665-669
Citation: S. Thomas et al., EFFECTS OF GRADED SUPERLATTICE ON END-POINT DETECTION FOR LOW DAMAGE HETEROJUNCTION BIPOLAR-TRANSISTOR ETCHING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 681-686
Citation: Jw. Weigold et al., ETCHING AND BORON-DIFFUSION OF HIGH-ASPECT-RATIO SI TRENCHES FOR RELEASED RESONATORS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 267-272
Authors:
HANISH CK
GRIZZLE JW
CHEN HH
KAMLET LI
THOMAS S
TERRY FL
PANG SW
Citation: Ck. Hanish et al., MODELING AND ALGORITHM DEVELOPMENT FOR AUTOMATED OPTICAL ENDPOINTING OF AN HBT EMITTER ETCH, Journal of electronic materials, 26(12), 1997, pp. 1401-1408
Authors:
EDDY CR
GLEMBOCKI OJ
LEONHARDT D
SHAMAMIAN VA
HOLM RT
THOMS BD
BUTLER JE
PANG SW
Citation: Cr. Eddy et al., GALLIUM-ARSENIDE SURFACE-CHEMISTRY AND SURFACE DAMAGE IN A CHLORINE HIGH-DENSITY PLASMA ETCH PROCESS, Journal of electronic materials, 26(11), 1997, pp. 1320-1325
Citation: Sw. Pang et al., PRECISE ETCH-STOP FOR EMITTER ETCHING OF SELF-ALIGNED HETEROJUNCTION BIPOLAR-TRANSISTORS, Applied surface science, 117, 1997, pp. 758-764
Citation: Sw. Pang, PAPERS FROM THE 40TH INTERNATIONAL-CONFERENCE ON ELECTRON, ION, AND PHOTON-BEAM TECHNOLOGY AND NANOFABRICATION 28-31 MAY 1996, ATLANTA MARRIOTT MARQUIS, ATLANTA, GEORGIA - PREFACE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3619-3619
Citation: Kk. Ko et al., EFFECTS OF ETCH-INDUCED DAMAGE ON THE ELECTRICAL CHARACTERISTICS OF INPLANE GATED QUANTUM-WIRE TRANSISTORS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3663-3667
Citation: Mr. Rakhshandehroo et Sw. Pang, SHARPENING SI FIELD EMITTER TIPS BY DRY-ETCHING AND LOW-TEMPERATURE PLASMA OXIDATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3697-3701
Citation: Wh. Juan et Sw. Pang, CONTROLLING SIDEWALL SMOOTHNESS FOR MICROMACHINED SI MIRRORS AND LENSES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4080-4084
Citation: S. Thomas et Sw. Pang, DRY-ETCHING OF HORIZONTAL DISTRIBUTED-BRAGG-REFLECTOR MIRRORS FOR WAVE-GUIDE LASERS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4119-4123