Authors:
PANJAN P
NAVINSEK B
CVELBAR A
ZALAR A
VLCEK J
Citation: P. Panjan et al., HIGH-TEMPERATURE OXIDATION OF TIN CRN MULTILAYERS REACTIVELY SPUTTERED AT LOW-TEMPERATURES/, Surface & coatings technology, 98(1-3), 1998, pp. 1497-1502
Authors:
ZALAR A
BARETZKY B
DETTENWANGER F
RUBLE M
PANJAN P
Citation: A. Zalar et al., INTERDIFFUSION AT THE AL2O3 TI INTERFACE STUDIED IN THIN-FILM STRUCTURES/, Surface and interface analysis, 26(11), 1998, pp. 861-867
Citation: B. Navinsek et al., INDUSTRIAL APPLICATIONS OF CRN (PVD) COATINGS, DEPOSITED AT HIGH AND LOW-TEMPERATURES, Surface & coatings technology, 97(1-3), 1997, pp. 182-191
Citation: A. Zalar et al., CHARACTERIZATION OF CHEMICAL INTERDIFFUSIVITIES AT SILICON METAL INTERFACES IN INITIAL REACTION STAGES/, Vacuum, 48(7-9), 1997, pp. 625-627
Citation: A. Zalar et al., OXIDE THIN-FILMS FORMED DURING ROTATIONAL AES SPUTTER DEPTH PROFILINGOF NI CR MULTILAYERS USING OXYGEN IONS/, Applied surface science, 101, 1996, pp. 92-96
Authors:
PANJAN P
NAVINSEK B
CVELBAR A
ZALAR A
MILOSEV I
Citation: P. Panjan et al., OXIDATION OF TIN, ZRN, TIZRN, CRN, TICRN AND TIN CRN MULTILAYER HARD COATINGS REACTIVELY SPUTTERED AT LOW-TEMPERATURE/, Thin solid films, 282(1-2), 1996, pp. 298-301
Citation: B. Navinsek et al., CHARACTERIZATION OF LOW-TEMPERATURE CRN AND TIN (PVD) HARD COATINGS, Surface & coatings technology, 74-5(1-3), 1995, pp. 155-161
Citation: Ew. Seibt et al., INTERDIFFUSION EFFECTS IN HIGH-T-C SUPERCONDUCTING STRUCTURES BY AUGER-ELECTRON SPECTROSCOPY, Vacuum, 46(8-10), 1995, pp. 1043-1047
Citation: A. Zalar et al., CHARACTERIZATION OF INTERMETALLIC PHASES AND OXIDES FORMED IN ANNEALED NI AL MULTILAYER STRUCTURES/, Thin solid films, 270(1-2), 1995, pp. 341-345
Citation: Ew. Seibt et al., INTERFACIAL DEPTH PROFILING OF SUPERCONDUCTING HIGH-T(C) MONOLAYER AND MULTILAYER STRUCTURES BY AUGER-ELECTRON SPECTROSCOPY, Surface and interface analysis, 22(1-12), 1994, pp. 380-386
Citation: A. Zalar et al., INTERFACIAL REACTIONS AND SILICIDE FORMATION IN SI NI/SI AND SI/CR/SISANDWICH LAYERS/, Surface and interface analysis, 21(8), 1994, pp. 560-565
Citation: A. Zalar et al., AUGER-ELECTRON SPECTROSCOPY ROTATIONAL DEPTH PROFILING OF NI CR MULTILAYERS USING O2+ AND AR+ IONS, Thin solid films, 246(1-2), 1994, pp. 35-41
Authors:
HANZEL D
MEISEL W
HANZEL D
GRIESBACH P
NAVINSEK B
PANJAN P
GUTLICH P
Citation: D. Hanzel et al., CONVERSION ELECTRON MOSSBAUER CHARACTERIZATION OF FE-TI AND FE-TIN INTERFACES IN DEPENDENCE ON PRETREATMENTS AND BIAS VOLTAGE IN PHYSICAL VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3034-3039
Citation: B. Navinsek et P. Panjan, OXIDATION RESISTANCE OF PVD CR, CR-N AND CR-N-O HARD COATINGS, Surface & coatings technology, 59(1-3), 1993, pp. 244-248
Authors:
HOFMANN S
ZALAR A
CIRLIN EH
VAJO JJ
MATHIEU HJ
PANJAN P
Citation: S. Hofmann et al., INTERLABORATORY COMPARISON OF THE DEPTH RESOLUTION IN SPUTTER DEPTH PROFILING OF NI CR MULTILAYERS WITH AND WITHOUT SAMPLE ROTATION USING AES, XPS AND SIMS/, Surface and interface analysis, 20(8), 1993, pp. 621-626
Citation: A. Zalar et al., AUGER-ELECTRON SPECTROSCOPY STUDIES OF INTERFACIAL REACTIONS IN METALSEMICONDUCTOR MULTILAYERS ACTIVATED DURING DIFFERENTIAL SCANNING CALORIMETRY MEASUREMENTS/, Thin solid films, 236(1-2), 1993, pp. 169-172
Authors:
PIMENTEL F
ZALAR A
HOFMANN S
KOHL D
PANJAN P
Citation: F. Pimentel et al., A STUDY OF THERMALLY ACTIVATED INTERFACIAL REACTIONS IN AN NI CR/SI MULTILAYER STRUCTURE/, Thin solid films, 228(1-2), 1993, pp. 149-153
Authors:
PANJAN P
NAVINSEK B
ZABKAR A
MARINKOVIC V
MANDRINO D
FISER J
Citation: P. Panjan et al., STRUCTURAL-ANALYSIS OF ZR-N AND TI-N FILMS PREPARED BY REACTIVE PLASMA BEAM DEPOSITION, Thin solid films, 228(1-2), 1993, pp. 233-237