Authors: RONSE K PFORR R BAIK KH JONCKHEERE R VANDENHOVE L

Citation: K. Ronse et al., EXTENDING THE LIMITS OF OPTICAL LITHOGRAPHY FOR ARBITRARY MASK LAYOUTS USING ATTENUATED PHASE-SHIFTING MASKS WITH OPTIMIZED ILLUMINATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3783-3792

Authors: KUNZE D PFORR R

Citation: D. Kunze et R. Pforr, BLEACHABLE DYED RESIST - INVESTIGATION OF ITS PROCESS LATITUDE IN COMPARISON WITH STANDARD RESISTS, Microelectronic engineering, 25(1), 1994, pp. 3-20

Authors: RONSE K PFORR R BAIK KH JONCKHEERE R VANDENHOVE L

Citation: K. Ronse et al., ATTENUATED PHASE-SHIFTING MASKS IN COMBINATION WITH OFF-AXIS ILLUMINATION - A WAY TOWARDS QUARTER MICRON DUV LITHOGRAPHY FOR RANDOM LOGIC APPLICATIONS, Microelectronic engineering, 23(1-4), 1994, pp. 133-138