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Results: 1-11 |
Results: 11
SPECTROSCOPIC STUDIES OF A MAGNETRON SPUTTERING DISCHARGE FOR BORON-NITRIDE DEPOSITION
Authors: PINTASKE R WELZEL T SCHALLER M KAHL N HAHN J RICHTER F
Citation: R. Pintaske et al., SPECTROSCOPIC STUDIES OF A MAGNETRON SPUTTERING DISCHARGE FOR BORON-NITRIDE DEPOSITION, Surface & coatings technology, 99(3), 1998, pp. 266-273
FORMATION OF CUBIC BORON-NITRIDE THIN-FILMS BY REACTIVE CATHODIC ARC EVAPORATION
Authors: KRANNICH G RICHTER F HAHN J PINTASKE R FILIPPOV VB PADERNO Y
Citation: G. Krannich et al., FORMATION OF CUBIC BORON-NITRIDE THIN-FILMS BY REACTIVE CATHODIC ARC EVAPORATION, DIAMOND AND RELATED MATERIALS, 6(8), 1997, pp. 1005-1009
FORMATION OF C-BN THIN-FILMS UNDER REDUCED ION IMPACT
Authors: HAHN J RICHTER F PINTASKE R RODER M SCHNEIDER E WELZEL T
Citation: J. Hahn et al., FORMATION OF C-BN THIN-FILMS UNDER REDUCED ION IMPACT, Surface & coatings technology, 92(1-2), 1997, pp. 129-134
PROCESS DIAGNOSTICS DURING THE DEPOSITION OF CUBIC BORON-NITRIDE
Authors: PINTASKE R WELZEL T KAHL N SCHALLER M HAHN J RICHTER F
Citation: R. Pintaske et al., PROCESS DIAGNOSTICS DURING THE DEPOSITION OF CUBIC BORON-NITRIDE, Surface & coatings technology, 90(3), 1997, pp. 275-284
UTILIZATION OF CATHODIC ARC EVAPORATION FOR THE DEPOSITION OF BORON-NITRIDE THIN-FILMS
Authors: RICHTER F KRANNICH G HAHN J PINTASKE R FRIEDRICH M SCHMIDBAUER S ZAHN DRT
Citation: F. Richter et al., UTILIZATION OF CATHODIC ARC EVAPORATION FOR THE DEPOSITION OF BORON-NITRIDE THIN-FILMS, Surface & coatings technology, 90(1-2), 1997, pp. 178-183
OPTICAL-EMISSION SPECTROSCOPY IN CATHODIC ARC DEPOSITION
Authors: KUHN M PINTASKE R RICHTER F
Citation: M. Kuhn et al., OPTICAL-EMISSION SPECTROSCOPY IN CATHODIC ARC DEPOSITION, IEEE transactions on plasma science, 25(4), 1997, pp. 694-699
THE EFFECT OF ADDITIONAL ION PLASMA ASSISTANCE IN CNX-FILM DEPOSITIONBASED ON A FILTERED CATHODIC ARC/
Authors: KUHN M SPAETH C PINTASKE R PETER S RICHTER F ANDERS A
Citation: M. Kuhn et al., THE EFFECT OF ADDITIONAL ION PLASMA ASSISTANCE IN CNX-FILM DEPOSITIONBASED ON A FILTERED CATHODIC ARC/, Thin solid films, 311(1-2), 1997, pp. 151-156
CUBIC BORON-NITRIDE FILMS BY DC AND RF MAGNETRON SPUTTERING - LAYER CHARACTERIZATION AND PROCESS DIAGNOSTICS
Authors: HAHN J FRIEDRICH M PINTASKE R SCHALLER M KAHL N ZAHN DRT RICHTER F
Citation: J. Hahn et al., CUBIC BORON-NITRIDE FILMS BY DC AND RF MAGNETRON SPUTTERING - LAYER CHARACTERIZATION AND PROCESS DIAGNOSTICS, DIAMOND AND RELATED MATERIALS, 5(10), 1996, pp. 1103-1112
IN-SITU CHARACTERIZATION OF A PLASMA METALORGANIC CHEMICAL-VAPOR-DEPOSITION PROCESS
Authors: RICHTER F PETER S PINTASKE R HECHT G
Citation: F. Richter et al., IN-SITU CHARACTERIZATION OF A PLASMA METALORGANIC CHEMICAL-VAPOR-DEPOSITION PROCESS, Surface & coatings technology, 68, 1994, pp. 719-723
DETERMINATION OF MASS AND ENERGY-DISTRIBUTION OF IONS IN GLOW-DISCHARGES
Authors: PETER S PINTASKE R HECHT G RICHTER F
Citation: S. Peter et al., DETERMINATION OF MASS AND ENERGY-DISTRIBUTION OF IONS IN GLOW-DISCHARGES, Surface & coatings technology, 59(1-3), 1993, pp. 97-100
ION ENERGY-DISTRIBUTION MEASUREMENTS IN GLOW-DISCHARGES
Authors: PETER S PINTASKE R HECHT G RICHTER F
Citation: S. Peter et al., ION ENERGY-DISTRIBUTION MEASUREMENTS IN GLOW-DISCHARGES, Journal of nuclear materials, 200(3), 1993, pp. 412-416
Risultati: 1-11 |