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Results: 1-7 |
Results: 7
NANOSTRUCTURE FABRICATION BY REACTIVE-ION ETCHING OF LASER-FOCUSED CHROMIUM ON SILICON
Authors: MCCLELLAND JJ GUPTA R CELOTTA RJ PORKOLAB GA
Citation: Jj. Mcclelland et al., NANOSTRUCTURE FABRICATION BY REACTIVE-ION ETCHING OF LASER-FOCUSED CHROMIUM ON SILICON, Applied physics. B, Lasers and optics, 66(1), 1998, pp. 95-98
AIR-BRIDGES, AIR-RAMPS, PLANARIZATION, AND ENCAPSULATION USING PYROLYTIC PHOTORESIST IN THE FABRICATION OF 3-DIMENSIONAL MICROSTRUCTURES
Authors: PORKOLAB GA CHEN YJ TABATABAEI SA AGARWALA S JOHNSON FG KING O DAGENAIS M FRIZZELL RE BEARD WT STONE DR
Citation: Ga. Porkolab et al., AIR-BRIDGES, AIR-RAMPS, PLANARIZATION, AND ENCAPSULATION USING PYROLYTIC PHOTORESIST IN THE FABRICATION OF 3-DIMENSIONAL MICROSTRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 1961-1965
WET-CHEMISTRY SURFACE-TREATMENT FOR DARK-CURRENT REDUCTION THAT PRESERVES LATERAL DIMENSIONS OF REACTIVE ION ETCHED GA0.47IN0.53AS P-I-N-DIODE PHOTODETECTORS
Authors: PORKOLAB GA CHEN YJ MERRITT SA TABATABAEI SA AGARWALA S JOHNSON FG KING O DAGENAIS M WILSON RA STONE DR
Citation: Ga. Porkolab et al., WET-CHEMISTRY SURFACE-TREATMENT FOR DARK-CURRENT REDUCTION THAT PRESERVES LATERAL DIMENSIONS OF REACTIVE ION ETCHED GA0.47IN0.53AS P-I-N-DIODE PHOTODETECTORS, IEEE photonics technology letters, 9(4), 1997, pp. 490-492
ULTRAHIGH-VACUUM CHEMICALLY ASSISTED ION-BEAM ETCHING SYSTEM WITH A 3-GRID ION-SOURCE
Authors: HRYNIEWICZ JV CHEN YJ HSU SH LEE CHD PORKOLAB GA
Citation: Jv. Hryniewicz et al., ULTRAHIGH-VACUUM CHEMICALLY ASSISTED ION-BEAM ETCHING SYSTEM WITH A 3-GRID ION-SOURCE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 15(3), 1997, pp. 616-621
ETCH-MASK OF PYROLYTIC-PHOTORESIST THIN-FILM FOR SELF-ALIGNED FABRICATION OF SMOOTH AND DEEP FACETED 3-DIMENSIONAL MICROSTRUCTURES
Authors: PORKOLAB GA HSU SH HRYNIEWICZ JV LIN WH CHEN YJ AGARWALA S JOHNSON FG KING O DAGENAIS M STONE DR
Citation: Ga. Porkolab et al., ETCH-MASK OF PYROLYTIC-PHOTORESIST THIN-FILM FOR SELF-ALIGNED FABRICATION OF SMOOTH AND DEEP FACETED 3-DIMENSIONAL MICROSTRUCTURES, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 3650-3653
LITHOGRAPHY USING ELECTRON-BEAM-INDUCED ETCHING OF A CARBON-FILM
Authors: WANG D HOYLE PC CLEAVER JRA PORKOLAB GA MACDONALD NC
Citation: D. Wang et al., LITHOGRAPHY USING ELECTRON-BEAM-INDUCED ETCHING OF A CARBON-FILM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(5), 1995, pp. 1984-1987
SELF-ALIGNED FABRICATION OF ARRAYS OF BACK-TO-BACK EXTERNAL 45-DEGREES REFLECTORS INTEGRATED WITH RIDGE-WAVE-GUIDE LASERS FOR SURFACE-EMITTING HIGH-POWER SEMICONDUCTOR-LASER SOURCES IN ALGAAS GAAS/
Authors: PORKOLAB GA WOLF ED
Citation: Ga. Porkolab et Ed. Wolf, SELF-ALIGNED FABRICATION OF ARRAYS OF BACK-TO-BACK EXTERNAL 45-DEGREES REFLECTORS INTEGRATED WITH RIDGE-WAVE-GUIDE LASERS FOR SURFACE-EMITTING HIGH-POWER SEMICONDUCTOR-LASER SOURCES IN ALGAAS GAAS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2552-2555
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