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Citation: S. Halama et al., THE VIENNESE INTEGRATED SYSTEM FOR TECHNOLOGY CAD APPLICATIONS, Microelectronics, 26(2-3), 1995, pp. 137-158

Authors: STIPPEL H LEITNER E PICHLER C PUCHNER H STRASSER E SELBERHERR S

Citation: H. Stippel et al., PROCESS SIMULATION FOR THE 1990S, Microelectronics, 26(2-3), 1995, pp. 203-215

Authors: PUCHNER H SELBERHERR S

Citation: H. Puchner et S. Selberherr, AN ADVANCED MODEL FOR DOPANT DIFFUSION IN POLYSILICON, I.E.E.E. transactions on electron devices, 42(10), 1995, pp. 1750-1755