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Results:
1-8
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Results: 8
Authors:
Pantenburg, FJ
Mohr, J
Citation: Fj. Pantenburg et J. Mohr, Deep X-ray lithography for the fabrication of microstructures at ELSA, NUCL INST A, 467, 2001, pp. 1269-1273
Authors:
Perennes, F
De Bona, F
Pantenburg, FJ
Citation: F. Perennes et al., Deep X-ray lithography beamline at ELETTRA, NUCL INST A, 467, 2001, pp. 1274-1278
Authors:
Perennes, F
Pantenburg, FJ
Citation: F. Perennes et Fj. Pantenburg, Adhesion improvement in the deep X-ray lithography process using a centralbeam-stop, NUCL INST B, 174(3), 2001, pp. 317-323
Authors:
Reim, M
Pantenburg, FJ
Ziegler, CD
Citation: M. Reim et al., Influence of bloodserum and dextrane on the metabolism of organ cultures of cornea - to improve donor material for keratoplasty, KLIN MONATS, 218(2), 2001, pp. 95-101
Authors:
El-Kholi, A
Bade, K
Mohr, J
Pantenburg, FJ
Tang, XM
Citation: A. El-kholi et al., Alternative resist adhesion and electroplating layers for LIGA process, MICROSYST T, 6(5), 2000, pp. 161-164
Authors:
Gottert, J
Moser, HO
Pantenburg, FJ
Saile, V
Steininger, R
Citation: J. Gottert et al., ANKA - a synchrotron light source for X-ray based micromachining, MICROSYST T, 6(3), 2000, pp. 113-116
Authors:
Achenbach, S
Mohr, J
Pantenburg, FJ
Citation: S. Achenbach et al., Application of Scanning Probe Microscopy for the determination of the structural accuracy of high aspect ratio microstructures, MICROEL ENG, 53(1-4), 2000, pp. 637-640
Authors:
Pantenburg, FJ
Achenbach, S
Mohr, J
Citation: Fj. Pantenburg et al., Influence of developer temperature and resist material on the structure quality in deep x-ray lithography, J VAC SCI B, 16(6), 1998, pp. 3547-3551
Risultati:
1-8
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