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Kurilcik, N
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Porowski, S
Citation: S. Jursenas et al., Decay of stimulated and spontaneous emission in highly excited homoepitaxial GaN, APPL PHYS L, 78(24), 2001, pp. 3776-3778
Authors:
Neu, G
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Witowski, AM
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Citation: G. Neu et al., Far-infrared and selective photoluminescence studies of shallow donors in GaN hetero- and homoepitaxial layers, APPL PHYS L, 77(9), 2000, pp. 1348-1350
Authors:
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Citation: Ma. Khan et al., GaN-AlGaN heterostructure field-effect transistors over bulk GaN substrates, APPL PHYS L, 76(25), 2000, pp. 3807-3809
Authors:
Leszczynski, M
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Citation: M. Leszczynski et al., Lattice parameters of GaN single crystals, homoepitaxial layers and heteroepitaxial layers on sapphire, J ALLOY COM, 286(1-2), 1999, pp. 271-275
Authors:
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Citation: E. Frayssinet et al., Infrared reflectivity and transport investigations of GaN single crystals and homoepitaxial layers, PHYS ST S-B, 216(1), 1999, pp. 91-94
Authors:
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Citation: J. Domagala et al., Changes in the microstructure of GaN layers on sapphire upon annealing at high pressure, THIN SOL FI, 350(1-2), 1999, pp. 295-299
Authors:
Prystawko, P
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Teisseyre, H
Suski, T
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Citation: P. Prystawko et al., Epitaxy of ternary nitrides on GaN single crystals, J CRYST GR, 199, 1999, pp. 1061-1065
Authors:
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Schwegler, V
Eberhard, F
Kamp, M
Ebeling, KJ
Kornitzer, K
Ebner, T
Thonke, K
Sauer, R
Prystawko, P
Leszczynski, M
Grzegory, I
Porowski, S
Citation: C. Kirchner et al., Homoepitaxial growth of GaN by metalorganic vapor phase epitaxy: A benchmark for GaN technology, APPL PHYS L, 75(8), 1999, pp. 1098-1100
Authors:
Schauler, M
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Schwegler, V
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Citation: M. Schauler et al., Dry etching of GaN substrates for high-quality homoepitaxy, APPL PHYS L, 74(8), 1999, pp. 1123-1125