Authors:
HUANG JY
YE ZZ
LU HM
JIANG XB
WU HZ
ZHAO BH
WANG L
QUE DL
Citation: Jy. Huang et al., SIGE EPITAXY WITH GRADED BUFFER BY ULTRAHIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION, Chinese Physics Letters, 15(9), 1998, pp. 692-694
Citation: Hm. Lu et al., THERMAL WARPAGE OF CZOCHRALSKI SILICON-WAFERS GROWN UNDER A NITROGEN AMBIENCE, Physica status solidi. a, Applied research, 169(2), 1998, pp. 193-198
Authors:
WU HZ
HUANG JY
YE ZZ
JIANG XB
SHOU X
QUE DL
Citation: Hz. Wu et al., STRAIN RELAXATION IN GRADED SIGE GROWN BY ULTRA-HIGH-VACUUM CHEMICAL-VAPOR-DEPOSITION (UHVCVD), Journal of crystal growth, 191(1-2), 1998, pp. 72-78
Citation: Xw. Zhang et al., EFFECT OF IRON ON OXYGEN PRECIPITATION IN NITROGEN-DOPED CZOCHRALSKI SILICON, Journal of applied physics, 84(10), 1998, pp. 5502-5505
Citation: Jy. Huang et al., CALCULATION OF CRITICAL LAYER THICKNESS CONSIDERING THERMAL STRAIN INSI1-XGEX SI STRAINED-LAYER HETEROSTRUCTURES/, Journal of applied physics, 83(1), 1998, pp. 171-173
Citation: M. Qiu et al., THE ADSORPTION AND DISSOCIATION OF AMMONIA ON THE SI-10 CLUSTER-SURFACE, Journal of physics. Condensed matter, 9(31), 1997, pp. 6543-6553
Citation: Xw. Zhang et al., GENERATION AND DISSOCIATION OF THE NITROGEN-RELATED DONOR IN NITROGEN-DOPED CZ-SI DURING HEAT-TREATMENTS, Physica status solidi. a, Applied research, 155(1), 1996, pp. 189-194
Citation: Dr. Yang et al., EFFECT OF NITROGEN-OXYGEN COMPLEX ON ELECTRICAL-PROPERTIES OF CZOCHRALSKI SILICON, Applied physics letters, 68(4), 1996, pp. 487-489
Citation: Xy. Ma et al., PHOTOLUMINESCENCE OF A SILICON-OXIDE FILM FORMED BY ANODIZATION IN THE ELECTROPOLISHING REGION IN HF SOLUTION, Journal of physics. Condensed matter, 7(14), 1995, pp. 2901-2907