ACNP - Italian Periodicals Catalogue

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Results: 1-11 |

Results: 11

RADIATION-FIELD MODELING IN A PHOTOCATALYTIC MONOLITH REACTOR

Authors: HOSSAIN MM RAUPP GB

Citation: Mm. Hossain et Gb. Raupp, RADIATION-FIELD MODELING IN A PHOTOCATALYTIC MONOLITH REACTOR, Chemical Engineering Science, 53(22), 1998, pp. 3771-3780

VACUUM PHOTOCATALYTIC OXIDATION OF TRICHLOROETHYLENE

Authors: ANNAPRAGADA R LEET R CHANGRANI R RAUPP GB

Citation: R. Annapragada et al., VACUUM PHOTOCATALYTIC OXIDATION OF TRICHLOROETHYLENE, Environmental science & technology, 31(7), 1997, pp. 1898-1901

2-FLUX RADIATION-FIELD MODEL FOR AN ANNULAR PACKED-BED PHOTOCATALYTICOXIDATION REACTOR

Authors: RAUPP GB NICO JA ANNANGI S CHANGRANI R ANNAPRAGADA R

Citation: Gb. Raupp et al., 2-FLUX RADIATION-FIELD MODEL FOR AN ANNULAR PACKED-BED PHOTOCATALYTICOXIDATION REACTOR, AIChE journal, 43(3), 1997, pp. 792-801

FEATURE SCALE SIMULATION STUDIES OF TEOS-SOURCED REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SILICON DIOXIDE - ROLE OF OXYGEN-ATOM RECOMBINATION

Authors: VIRMANI M LEVEDAKIS DA RAUPP GB CALE TS

Citation: M. Virmani et al., FEATURE SCALE SIMULATION STUDIES OF TEOS-SOURCED REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF SILICON DIOXIDE - ROLE OF OXYGEN-ATOM RECOMBINATION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 14(3), 1996, pp. 977-983

PHOTOCATALYTIC OXIDATION FOR POINT-OF-USE ABATEMENT OF VOLATILE ORGANIC-COMPOUNDS IN MICROELECTRONICS MANUFACTURING

Authors: RAUPP GB

Citation: Gb. Raupp, PHOTOCATALYTIC OXIDATION FOR POINT-OF-USE ABATEMENT OF VOLATILE ORGANIC-COMPOUNDS IN MICROELECTRONICS MANUFACTURING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1883-1887

CONFORMALITY OF SIO2-FILMS FROM TETRAETHOXYSILANE-SOURCED REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION

Authors: RAUPP GB LEVEDAKIS DA CALE TS

Citation: Gb. Raupp et al., CONFORMALITY OF SIO2-FILMS FROM TETRAETHOXYSILANE-SOURCED REMOTE MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 676-680

PREDICTING INTRAWAFER FILM THICKNESS UNIFORMITY IN AN ULTRALOW PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR

Authors: RAUPP GB LEVEDAKIS DA CALE TS

Citation: Gb. Raupp et al., PREDICTING INTRAWAFER FILM THICKNESS UNIFORMITY IN AN ULTRALOW PRESSURE CHEMICAL-VAPOR-DEPOSITION REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3053-3061

PHOTOCATALYTIC OXIDATION OF OXYGENATED AIR TOXICS

Authors: RAUPP GB JUNIO CT

Citation: Gb. Raupp et Ct. Junio, PHOTOCATALYTIC OXIDATION OF OXYGENATED AIR TOXICS, Applied surface science, 72(4), 1993, pp. 321-327

STEP COVERAGE PREDICTIONS USING COMBINED REACTOR SCALE AND FEATURE SCALE MODELS FOR BLANKET TUNGSTEN LPCVD

Authors: CALE TS PARK JH GANDY TH RAUPP GB JAIN MK

Citation: Ts. Cale et al., STEP COVERAGE PREDICTIONS USING COMBINED REACTOR SCALE AND FEATURE SCALE MODELS FOR BLANKET TUNGSTEN LPCVD, Chemical engineering communications, 119, 1993, pp. 197-220

CHARACTERIZATION OF PHOSPHOSILICATE GLASS-FILMS OBTAINED USING PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FROM TETRAETHYLORTHOSILICATE AND TRIMETHYLPHOSPHITE

Authors: PILLOTE CL SHEMANSKY FA CALE TS RAUPP GB

Citation: Cl. Pillote et al., CHARACTERIZATION OF PHOSPHOSILICATE GLASS-FILMS OBTAINED USING PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION FROM TETRAETHYLORTHOSILICATE AND TRIMETHYLPHOSPHITE, Thin solid films, 236(1-2), 1993, pp. 287-293

KINETICS AND CONFORMALITY OF TIN FILMS FROM TDEAT AND AMMONIA

Authors: CALE TS CHAARA MB RAUPP GB RAAIJMAKERS IJ

Citation: Ts. Cale et al., KINETICS AND CONFORMALITY OF TIN FILMS FROM TDEAT AND AMMONIA, Thin solid films, 236(1-2), 1993, pp. 294-300

Risultati: 1-11 |