Authors: CRAVEN MR CRANTON WM TOAL S REEHAL HS

Citation: Mr. Craven et al., CHARACTERIZATION OF BATIO3 THIN-FILMS DEPOSITED BY RF MAGNETRON SPUTTERING FOR USE IN A.C. TFEL DEVICES, Semiconductor science and technology, 13(4), 1998, pp. 404-409

Authors: THWAITES MJ REEHAL HS

Citation: Mj. Thwaites et Hs. Reehal, GROWTH OF SINGLE-CRYSTAL SI, GE AND SIGE LAYERS USING PLASMA-ASSISTEDCVD, Thin solid films, 294(1-2), 1997, pp. 76-79

Authors: REEHAL HS THWAITES MJ BRUTON TM

Citation: Hs. Reehal et al., THIN-FILM POLYCRYSTALLINE SILICON SOLAR-CELLS PREPARED BY PLASMA CVD, Physica status solidi. a, Applied research, 154(2), 1996, pp. 623-633

Authors: THWAITES MJ REEHAL HS

Citation: Mj. Thwaites et Hs. Reehal, PLASMA-ASSISTED CVD GROWTH OF HETEROEPITAXIAL SILICON-CARBIDE ON SILICON, Physica status solidi. a, Applied research, 153(2), 1996, pp. 459-463

Authors: REEHAL HS LESNIAK MP HUGHES AE

Citation: Hs. Reehal et al., APPLICATION OF DLTS TO SILICON SOLAR-CELL PROCESSING, Journal of physics. D, Applied physics, 29(3), 1996, pp. 934-938