Authors:
RAPTIS I
GLEZOS N
ROSENBUSCH A
PATSIS G
ARGITIS P
Citation: I. Raptis et al., CALCULATION OF ENERGY DEPOSITION IN THIN RESIST FILMS OVER MULTILAYERSUBSTRATES, Microelectronic engineering, 42, 1998, pp. 171-174
Citation: N. Glezos et al., E-BEAM PROXIMITY CORRECTION FOR NEGATIVE TONE CHEMICALLY AMPLIFIED RESISTS TAKING INTO ACCOUNT POST-BAKE EFFECTS, Microelectronic engineering, 42, 1998, pp. 319-322
Authors:
ROSENBUSCH A
KALUS CK
HOFMANN U
IRMSCHER M
Citation: A. Rosenbusch et al., ADVANCED APPLICATION OF HIERARCHY REORGANIZATION IN E-BEAM LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 77-80
Authors:
ROSENBUSCH A
HOFMANN U
KALUS CK
ENDO H
KIMURA Y
ENDO A
Citation: A. Rosenbusch et al., HIERARCHY OPTIMIZATION - A MEANS TO ENHANCE EFFICIENCY IN E-BEAM AND OPTICAL LITHOGRAPHY, JPN J A P 1, 34(12B), 1995, pp. 6631-6638