Authors:
SAMMELSELG V
ROSENTAL A
TARRE A
NIINISTO L
HEISKANEN K
ILMONEN K
JOHANSSON LS
UUSTARE T
Citation: V. Sammelselg et al., TIO2 THIN-FILMS BY ATOMIC LAYER DEPOSITION - A CASE OF UNEVEN GROWTH AT LOW-TEMPERATURE, Applied surface science, 134(1-4), 1998, pp. 78-86
Authors:
ROSENTAL A
ADAMSON P
GERST A
KOPPEL H
TARRE A
Citation: A. Rosental et al., ATOMIC LAYER DEPOSITION IN TRAVELING-WAVE REACTOR - IN-SITU DIAGNOSTICS BY OPTICAL REFLECTION, Applied surface science, 112, 1997, pp. 82-86
Citation: A. Rosental et al., MONITORING OF ATOMIC LAYER DEPOSITION BY INCREMENTAL DIELECTRIC REFLECTION, Applied surface science, 107, 1996, pp. 178-183
Citation: A. Rosental et A. Niilisk, OPTICAL IN-SITU CHARACTERIZATION OF DEPOSIT FORMATION UNDER ALTERNATESUPPLY OF DIETHYLZINC AND CO2 AT ROOM-TEMPERATURE, Surface science, 309, 1994, pp. 1188-1192