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Citation: Bw. Sheldon et al., Intrinsic stress, island coalescence, and surface roughness during the growth of polycrystalline films, J APPL PHYS, 90(10), 2001, pp. 5097-5103

Authors: Rajamani, A Beresford, R Sheldon, BW

Citation: A. Rajamani et al., Intrinsic stress evolution in aluminum nitride thin films and the influence of multistep processing, APPL PHYS L, 79(23), 2001, pp. 3776-3778