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Results: 1-10 |
Results: 10
Advances in microelectronic processing
Authors: Ravindra, NM Kumar, A
Citation: Nm. Ravindra et A. Kumar, Advances in microelectronic processing, JOM-J MIN, 53(6), 2001, pp. 42-42
Optical design of a near-infrared birefringent filter system and measurement of birefringent index of calcite at 1.56 mu m
Authors: Wang, JS Wang, HM Spirock, TJ Lee, CY Ravindra, NM Ma, J Goode, PR Denker, C
Citation: Js. Wang et al., Optical design of a near-infrared birefringent filter system and measurement of birefringent index of calcite at 1.56 mu m, OPT ENG, 40(6), 2001, pp. 1016-1023
Developing sensors for multifunctional applications
Authors: Kumar, A Ravindra, NM
Citation: A. Kumar et Nm. Ravindra, Developing sensors for multifunctional applications, JOM-J MIN, 52(10), 2000, pp. 14-14
Special issue on manufacturing issues in rapid thermal processing - Foreword
Authors: Ravindra, NM Downey, DF Marcus, SD Sopori, BL
Citation: Nm. Ravindra et al., Special issue on manufacturing issues in rapid thermal processing - Foreword, J ELEC MAT, 28(12), 1999, pp. 1327-1327
Calculation of emissivity of Si wafers
Authors: Sopori, B Chen, W Madjdpour, J Ravindra, NM
Citation: B. Sopori et al., Calculation of emissivity of Si wafers, J ELEC MAT, 28(12), 1999, pp. 1385-1389
Evidence from spectral emissometry for conduction intraband transitions inthe intrinsic regime for silicon
Authors: Abedrabbo, S Hensel, JC Fiory, AT Ravindra, NM
Citation: S. Abedrabbo et al., Evidence from spectral emissometry for conduction intraband transitions inthe intrinsic regime for silicon, J ELEC MAT, 28(12), 1999, pp. 1390-1393
Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials
Authors: Gokce, OH Amin, S Ravindra, NM Szostak, DJ Paff, RJ Fleming, JG Galewski, CJ Shallenberger, J Eby, R
Citation: Oh. Gokce et al., Effects of annealing on X-ray-amorphous CVD W-Si-N barrier layer materials, THIN SOL FI, 353(1-2), 1999, pp. 149-156
Special section on transient thermal processing of electronic materials - Foreword
Authors: Ravindra, NM Gokce, OH Sopori, BL
Citation: Nm. Ravindra et al., Special section on transient thermal processing of electronic materials - Foreword, J ELEC MAT, 27(12), 1998, pp. 1277-1277
Wafer emissivity independent temperature measurements
Authors: Abedrabbo, S Tong, FM Ravindra, NM Gelpey, J Marcus, S Fiory, AT
Citation: S. Abedrabbo et al., Wafer emissivity independent temperature measurements, J ELEC MAT, 27(12), 1998, pp. 1323-1328
Modeling emissivity of rough and textured silicon wafers
Authors: Sopori, BL Chen, W Abedrabbo, S Ravindra, NM
Citation: Bl. Sopori et al., Modeling emissivity of rough and textured silicon wafers, J ELEC MAT, 27(12), 1998, pp. 1341-1346
Risultati: 1-10 |