Authors: Hotovy, I Huran, J Siciliano, P Capone, S Spiess, L Rehacek, V

Citation: I. Hotovy et al., The influences of preparation parameters on NiO thin film properties for gas-sensing application, SENS ACTU-B, 78(1-3), 2001, pp. 126-132

Authors: Ivanic, R Rehacek, V Novotny, I Breternitz, V Spiess, L Knedlik, C Tvarozek, V

Citation: R. Ivanic et al., Sputtered yttrium oxide thin films appropriate for electrochemical sensors, VACUUM, 61(2-4), 2001, pp. 229-234

Authors: Hotovy, I Huran, J Spiess, L Hascik, S Rehacek, V

Citation: I. Hotovy et al., Preparation of nickel oxide thin films for gas sensors applications, SENS ACTU-B, 57(1-3), 1999, pp. 147-152

Authors: Riepl, M Mirsky, VM Novotny, I Tvarozek, V Rehacek, V Wolfbeis, OS

Citation: M. Riepl et al., Optimization of capacitive affinity sensors: drift suppression and signal amplification, ANALYT CHIM, 392(1), 1999, pp. 77-84