Authors:
Chhowalla, M
Teo, KBK
Ducati, C
Rupesinghe, NL
Amaratunga, GAJ
Ferrari, AC
Roy, D
Robertson, J
Milne, WI
Citation: M. Chhowalla et al., Growth process conditions of vertically aligned carbon nanotubes using plasma enhanced chemical vapor deposition, J APPL PHYS, 90(10), 2001, pp. 5308-5317
Authors:
Rupesinghe, NL
Chhowalla, M
Amaratunga, GAJ
Weightman, P
Martin, D
Unsworth, P
Murray, J
Citation: Nl. Rupesinghe et al., Influence of the heterojunction on the field emission from tetrahedral amorphous carbon on Si, APPL PHYS L, 77(12), 2000, pp. 1908-1910