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Results: 1-8 |
Results: 8

Authors: Lee, DO Roman, P Wu, CT Mahoney, W Horn, M Mumbauer, P Brubaker, M Grant, R Ruzyllo, J
Citation: Do. Lee et al., Studies of mist deposited high-k dielectrics for MOS gates, MICROEL ENG, 59(1-4), 2001, pp. 405-408

Authors: Lukasiak, L Roman, P Jakubowski, A Ruzyllo, J
Citation: L. Lukasiak et al., Analysis of surface and interface charge interactions in silicon on insulator (SOI) substrates, SOL ST ELEC, 45(1), 2001, pp. 95-100

Authors: Wu, CT Ridley, R Roman, P Dolny, G Grebs, T Hao, J Ruzyllo, J
Citation: Ct. Wu et al., The effect of surface treatments and growth conditions on electrical characteristics of thick (> 50 nm) gate oxides, J ELCHEM SO, 148(9), 2001, pp. F184-F188

Authors: Ruzyllo, J Rohr, E Baeyens, M Mertens, P Heyns, M
Citation: J. Ruzyllo et al., Fluorine in thermal oxides from HF preoxidation surface treatments, EL SOLID ST, 2(7), 1999, pp. 336-338

Authors: Roman, P Lee, DO Brubaker, M Kamieniecki, E Ruzyllo, J
Citation: P. Roman et al., Characterization of conductive oxides on silicon using non-contact surfacecharge profiling, MICROEL ENG, 48(1-4), 1999, pp. 181-184

Authors: Heyns, M Mertens, PW Ruzyllo, J Lee, MYM
Citation: M. Heyns et al., Advanced wet and dry cleaning coming together for next generation, SOL ST TECH, 42(3), 1999, pp. 37

Authors: Staffa, J Fakhouri, S Brubaker, M Roman, P Ruzyllo, J
Citation: J. Staffa et al., Effects controlling initiation and termination of gas-phase cleaning reactions, J ELCHEM SO, 146(1), 1999, pp. 321-326

Authors: Brubaker, M Roman, P Staffa, J Ruzyllo, J
Citation: M. Brubaker et al., Monitoring of chemical oxide removal from silicon surfaces using a surfacephotovoltage technique, EL SOLID ST, 1(3), 1998, pp. 130-132
Risultati: 1-8 |