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SCHAFFNIT C
THOMAS L
ROSSI F
HUGON R
PAULEAU Y
Citation: C. Schaffnit et al., PLASMA DIAGNOSTICS OF R.F. PACVD OF BORON-NITRIDE USING A BCL3-N-2-H-2-AR GAS-MIXTURE, Surface & coatings technology, 98(1-3), 1998, pp. 1262-1266
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Citation: C. Schaffnit et al., BEST PRACTICE ANALYSIS OF BANK BRANCHES - AN APPLICATION OF DEA IN A LARGE CANADIAN BANK, European journal of operational research, 98(2), 1997, pp. 269-289
Authors:
SABOURET E
SCHAFFNIT C
JONGSTE JF
JANSSEN GCAM
RADELAAR S
Citation: E. Sabouret et al., REACTIVE ION ETCHING OF METAL STACK CONSISTING OF AN ALUMINUM-ALLOY, WGEX, BARRIER AND TI ADHESION LAYER, Microelectronic engineering, 37-8(1-4), 1997, pp. 353-363
Authors:
SCHAFFNIT C
THOMAS L
ROSSI F
HUGON R
PAULEAU Y
Citation: C. Schaffnit et al., PLASMA-ASSISTED CHEMICAL-VAPOR-DEPOSITION OF BN COATINGS - EFFECT OF THE EXPERIMENTAL PARAMETERS ON THE STRUCTURE OF THE FILMS, Surface & coatings technology, 87-8(1-3), 1996, pp. 402-408
Authors:
SCHAFFNIT C
DELPUPPO H
HUGON R
THOMAS L
MORETTO P
ROSSI F
PAULEAU Y
Citation: C. Schaffnit et al., EFFECT OF H-2 CONCENTRATION ON RF PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF BORON-NITRIDE COATINGS FROM THE BCL3-N-2-H-2-AR GAS SYSTEM, Surface & coatings technology, 80(1-2), 1996, pp. 13-17